1.S. Chen, Z. Yang, H. Hartmann, A. Besmehn, Y. Yang, I. Valov, Electrochemical ohmic memristors for continual learning.Nat.Commun.16,2348(2025).
2.F. Michieletti#,S. Chen#, C. Weber, C. Ricciardi, T. Ohno, I. Valov, Influence of active electrode impurity on memristive characteristics of ECM devices.J.Solid State Electrochem.28,1735–1741(2024).
3.D. Sun, X. Zhu,S. Chen*, H. Fang, G. Zhu, G. Lan, L. He, Y. Shi*, Uniformity, Linearity, and Symmetry Enhancement in TiOx/MoS2–xOxBased Analog RRAM via S-Vacancy Confined Nanofilament.NanoLett. 24, 16283–16292 (2024).
4.S. Chen, T. Zheng, S. Tappertzhofen, Y. Yang and I. Valov, Electrochemical-Memristor-Based Artificial Neurons and Synapses—Fundamentals, Applications, and Challenges.Adv.Mater. 35, 2301924 (2023).
5.S. Chen, I. Valov, Design of Materials Configuration for Optimizing Redox-based Resistive Switching Memories.Adv.Mater. 34, 2105022 (2022).
6.S. Chen, M. R. Mahmoodi, Y. Shi, C. Mahata, B. Yuan, X. Liang, C. Wen, F. Hui, D. Akinwande, D. B. Strukov, M. Lanza, Wafer-scale integration of two-dimensional materials in high-density memristive crossbar arrays for artificial neural networks.Nat.Electron. 3, 638–645 (2020). (Cover paper)
7.S. Chen, S. Noori, M. A. Villena, Y. Shi, T. Han, Y. Zuo, M. Pedeferri, D. Strukov, M. Lanza, M. V. Diamanti, Memristive Electronic Synapses Made by Anodic Oxidation.Chem.Mater. 31, 8394–8401 (2019). (Cover paper)
8.D.Sun, S.Zhao, L.Jiang, G.Lan, X.Deng, W.Fang,S.Chen,Y.Shi, Hybrid optoelectronic encoding in ZnO thin film transistors for multimodal physical reservoirs.J.Phys.D:Appl.Phys.59(5),055101(2026).
9.D. Sun, A. Li, X. Deng, S. Zhao, Z. Xu, Q. Tan, Y. Wan, X. Li,S. Chen, I. Valov, Y. Shi, Dynamic Monolayer WSe2 Electrolyte-Gated Transistor with Coexistent Double Relaxation Timescale for Enhanced Physical Reservoir Computing.Small, 2504066(2025).
10.D.- Y. Cho, K.-J. Kim, K.-S. Lee, M. Luebben,S. Chen, I. Valov, Chemical Influence of Carbon Interface Layers in Metal/Oxide Resistive Switches.ACSAppl.Mater.Interfaces15, 18528–18536 (2023).
11.T.Frahm, M Buttberg, G.Gvozdev, R.A.Müller,S.Chen, B.Sun, L.Raffauf, S.Menzel, I.Valov, D.Wouters, R.Waser, J.Knoch,Lateral Electrochemical Metallization Cells for Reconfigurable Interconnect Systems.IEEE J.Electron Devices Soc. 11, 432–437 (2023).